Controlled pulse-etching with xenon difluoride

@article{Chu1997ControlledPW,
  title={Controlled pulse-etching with xenon difluoride},
  author={Patrick B. Chu and J.-T. Chen and Roger Yeh and G. Lin and Jcm Huang and Brett Warneke and S.J. Pister},
  journal={Proceedings of International Solid State Sensors and Actuators Conference (Transducers '97)},
  year={1997},
  volume={1},
  pages={665-668 vol.1}
}
  • P. Chu, J. Chen, +4 authors S.J. Pister
  • Published 1997
  • Materials Science
  • Proceedings of International Solid State Sensors and Actuators Conference (Transducers '97)
A gas-phase, room-temperature, plasmaless isotropic etching system has been used for bulk and thin film silicon etching. A computer controlled multi-chambered etcher is used to provide precisely metered pulses of xenon difluoride (XeF/sub 2/) gas to the etch chamber. Etch rates as high as 15 microns per minute have been observed. The etch appears to have infinite selectivity to many common thin films, including silicon dioxide, silicon nitride, photoresist, and aluminum. The etch rate, profile… Expand
Gas phase pulse etching of silicon for MEMS with xenon difluoride
TLDR
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Deep etching of silicon with XeF/sub 2/ gas
  • B. Bahreyni, C. Shafai
  • Computer Science
  • IEEE CCECE2002. Canadian Conference on Electrical and Computer Engineering. Conference Proceedings (Cat. No.02CH37373)
  • 2002
TLDR
This paper presents results of silicon etching using XeF/sub 2/ gas, and good agreement was found between the simulated profiles and the actual measured etch profiles at the mean free path of Xef/ sub 2/ etching pressures. Expand
Determination of etching parameters for pulsed XeF 2 etching of silicon using chamber pressure data
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While there are a number of different “dry” process technologies that can be utilized to release MEMS structures, including plasma-based isotropic etching using SF6 (non-Bosch process) forExpand
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This paper presents characterization of the effects of XeF2 vapor phase etching conditions on the lateral etch rate and etch uniformity of a sacrificial, epitaxial Nb2N layer grown between a III-NExpand
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"J."
however (for it was the literal soul of the life of the Redeemer, John xv. io), is the peculiar token of fellowship with the Redeemer. That love to God (what is meant here is not God’s love to men)Expand
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