Computer Simulation of Crystal Growth and Dissolution in Metals and Semiconductors
@article{Clancy1991ComputerSO,
title={Computer Simulation of Crystal Growth and Dissolution in Metals and Semiconductors},
author={Paulette Clancy},
journal={International Journal of High Performance Computing Applications},
year={1991},
volume={5},
pages={10 - 33}
}understanding of the underlying atomic-scale mechanisms responsible for a variety of phenomena concerned with materials processing (for a nontechnical introduction to the subject, see Phillpot, Yip, and Wolf, 1989). For example, atomic-scale simulations using both Monte Carlo and molecular dynamics techniques have been used to emulate processes such as crystal growth of semiconductors (Landman et al., 1988; Broughton and Abraham, 1986; Grabow, Gilmer, and Bakker, 1990), molecular beam epitaxy… CONTINUE READING
