• Materials Science, Engineering
  • Published in SPIE Photomask Technology 2001
  • DOI:10.1117/12.410729

Comprehensive simulation of e-beam lithography processes using PROLITH/3D and TEMPTATION software tools

@inproceedings{Kuzmin2001ComprehensiveSO,
  title={Comprehensive simulation of e-beam lithography processes using PROLITH/3D and TEMPTATION software tools},
  author={Igor Yu. Kuzmin and Chris A. Mack},
  booktitle={SPIE Photomask Technology},
  year={2001}
}
Simulation of Electron Beam Lithography (EBL) is a complex task that includes precise modeling of physical and chemical effects. At this moment, there is no single software tool that is capable of modeling all these processes. In this paper we present a comprehensive simulation approach for the entire e-beam lithography process. This is possible by combining the simulation strengths of the TEMPTATION (Temperature Simulation) and PROLITH/3D software tools. TEMPTATION software was originally… CONTINUE READING

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