Comprehensive 3-D Notching Simulator With Non-Planar Substrates

  title={Comprehensive 3-D Notching Simulator With Non-Planar Substrates},
  author={Eytan Barouch and Brian Bradie and Uwe Hollerbach and George E. Karniadakis and S. Orszag},
A comprehensive three-dimensional simulation model for non-planar substrate lithography is presented. Matching substrate as well as standing wave effects are examined. The projection printing is simulated using Hopkins' results and the exposure model is solved using spectral element discretizations of the nonlinear wave equation coupled with the rate… CONTINUE READING