Composite ferromagnetic photoresist for the fabrication of microelectromechanical systems

@inproceedings{Damean2004CompositeFP,
  title={Composite ferromagnetic photoresist for the fabrication of microelectromechanical systems},
  author={Nicolae Damean and Babak A. Parviz and Jessamine Ng Lee and Teri W. Odom and George M Whitesides},
  year={2004}
}
This paper describes a simple method for the microfabrication of mechanically compliant, magnetically-responsive microstructures. These microstructures were fabricated in one step by using a ferromagnetic photoresist, which, in turn, was prepared by suspending nickel nanospheres in a negative photosensitive epoxy (SU8). The nominal diameter of the nickel nanospheres was 80–150 nm, that is, much smaller than the wavelength of the UV light (365 and 405 nm) used to expose the photoresist… CONTINUE READING
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