Compliant membranes improve resolution in full-wafer micro/nanostencil lithography.

@article{Sidler2012CompliantMI,
  title={Compliant membranes improve resolution in full-wafer micro/nanostencil lithography.},
  author={Katrin Sidler and Luis Guillermo Villanueva and Oscar Vazquez-Mena and Veronica Savu and Juergen Brugger},
  journal={Nanoscale},
  year={2012},
  volume={4 3},
  pages={773-8}
}
This work reports on a considerable resolution improvement of micro/nanostencil lithography when applied on full-wafer scale by using compliant membranes to reduce gap-induced pattern blurring. Silicon nitride (SiN) membranes are mechanically decoupled from a rigid silicon (Si) frame by means of four compliant, protruding cantilevers. When pressing the stencil into contact with a surface to be patterned, the membranes thus adapt to the surface independently and reduce the gap between the… CONTINUE READING