Compensation of high-speed drift by Cu-CMP APC in continuous input of high-mix products

@article{Miyashita2010CompensationOH,
  title={Compensation of high-speed drift by Cu-CMP APC in continuous input of high-mix products},
  author={Naoki Miyashita and Kenji Tamaki and Hirofumi Tsuchiyama and Nobuhiro Uchida and Kazuto Sakai and Kazuhiro Yamamoto},
  journal={2010 International Symposium on Semiconductor Manufacturing (ISSM)},
  year={2010},
  pages={1-4}
}
This paper presents a novel Cu-CMP APC that compensates the high-speed drift of thinning amount during the continuous input of high-mix products. Compensation is realized by estimating the polishing rate as the summation of the estimated standard drift and the amount of shift for each product group. A new algorithm in which the products with similar rates… CONTINUE READING