Compensating the overlay modeling errors in lithography process of wafer stepper

Abstract

The overlay modeling errors are commonly modeled as the sum of inter-field and intra-field errors in lithography process of wafer stepper. The inter-field errors characterize the global effect while the intra-field errors represent the local effect. To have a better resolution and alignment accuracy, it is important to model the overlay errors and… (More)

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Cite this paper

@article{Horng2010CompensatingTO, title={Compensating the overlay modeling errors in lithography process of wafer stepper}, author={Shih-Cheng Horng and Shin-Yi Wu}, journal={2010 5th IEEE Conference on Industrial Electronics and Applications}, year={2010}, pages={1399-1404} }