Comparison of structure and mechanical properties of SiO2-like films deposited in O2/HMDSO pulsed and continuous plasmas

@inproceedings{Bousquet2006ComparisonOS,
  title={Comparison of structure and mechanical properties of SiO2-like films deposited in O2/HMDSO pulsed and continuous plasmas},
  author={Ang{\'e}lique Bousquet and Vilma Bur{\vs}{\'i}kov{\'a} and A. Goullet and Abdou Djouadi and Lenka Zaj{\'i}{\vc}kov{\'a} and Agn{\`e}s Granier},
  year={2006}
}
In many applications (ophthalmic lenses, car headlights, etc.), silicon oxide films are used as protective coatings in order to improve the mechanical properties of polymers. The Plasma Enhanced Chemical Vapor Deposition (PECVD), which allows deposition of dense films at temperature near the ambient, is particularly relevant for this. In this work, SiO2-like films have been deposited in a helicon reactor operated in inductive mode at low pressure with pulsed O-2/HMDSO plasmas. The influence of… CONTINUE READING

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