Comparison of optical and electrical measurement techniques for CD metrology on alternating aperture phase-shifting masks

@article{Smith2006ComparisonOO,
  title={Comparison of optical and electrical measurement techniques for CD metrology on alternating aperture phase-shifting masks},
  author={Samantha E Smith and Andreas Tsiamis and Martin McCallum and A. C. Hourd and J S Stevenson and A V Walton},
  journal={2006 IEEE International Conference on Microelectronic Test Structures},
  year={2006},
  pages={119-123}
}
This paper presents a comparison of optical and electrical techniques for critical dimension (CD) metrology on binary and alternating aperture phase shifting masks. For the first time, measurements obtained from on-mask electrical CD structures are compared with optical measurements made using a deep ultra-violet (DUV) mask metrology system. Initial results… CONTINUE READING