Comparison of experimental and simulated extreme ultraviolet spectra of xenon and tin discharges.

@article{Kieft2005ComparisonOE,
  title={Comparison of experimental and simulated extreme ultraviolet spectra of xenon and tin discharges.},
  author={E R Kieft and Kurt Garloff and J. J. A. M. van der Mullen and Vadim Y. Banine},
  journal={Physical review. E, Statistical, nonlinear, and soft matter physics},
  year={2005},
  volume={71 3 Pt 2B},
  pages={036402}
}
Xenon and tin both are working elements applied in discharge plasmas that are being developed for application in extreme ultraviolet (EUV) lithography. Their spectra in the 10-21-nm-wavelength range have been analyzed. A fully analytical collisional-radiative model, including departure from equilibrium due to a net ionization rate, was used to simulate the… CONTINUE READING