Comparison between X-ray photon and secondary electron damage to DNA in vacuum.

@article{Cai2005ComparisonBX,
  title={Comparison between X-ray photon and secondary electron damage to DNA in vacuum.},
  author={Zhongli Cai and Pierre Cloutier and Darel John Hunting and L{\'e}on Sanche},
  journal={The journal of physical chemistry. B},
  year={2005},
  volume={109 10},
  pages={4796-800}
}
Both monolayer and thick (20 microm) films of dry pGEM-3Zf(-) plasmid DNA deposited on tantalum foil were exposed to Al Kalpha X-rays (1.5 keV) for various times in an ultrahigh vacuum chamber. For monolayer DNA, the damage was induced mainly by low energy secondary electrons (SEs) emitted from the tantalum. For the thick films, DNA damage was induced chiefly by X-ray photons. Different forms of plasmid DNA were separated and quantified by agarose gel electrophoresis. The exposure curves for… CONTINUE READING

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