Comparing process flow of monolithic CMOS-MEMS intergration on SOI wafers with monolithic BiMOS-MEMS integration on Silicon wafer

@article{Solanki2010ComparingPF,
  title={Comparing process flow of monolithic CMOS-MEMS intergration on SOI wafers with monolithic BiMOS-MEMS integration on Silicon wafer},
  author={Ashok Solanki and Kanti Prasad and Kieran Nunan and Rob Oreilly},
  journal={2010 53rd IEEE International Midwest Symposium on Circuits and Systems},
  year={2010},
  pages={1189-1192}
}
This paper describes the two different integrated fabrication process flows for microelectromechanical systems (MEMS) accelerometer with surface micromachining technology at Analog Devices (ADI). Each method has its own identity with several advantages and disadvantages with respect to each other. CMOS-MEMS are fabricated using silicon-on-insulator (SOI) substrate, which allows the monolithic integration of the mechanical transducer and the control electronics on the device single crystal… CONTINUE READING

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