Comparative evaluation of drying techniques for surface micromachining

@inproceedings{Kim2004ComparativeEO,
  title={Comparative evaluation of drying techniques for surface micromachining},
  author={Chang-Jin Kim and John Y. Kim and Balaji Sridharan},
  year={2004}
}
Five different procedures commonly used to rinse and dry released microstructures are compared: evaporation drying with deionized (DI) water or methanol, sublimation drying with t-butyl alcohol orp-dichlorobenzene, and supercritical drying with COz. For objectivecomparison, identical test structures, made by the MCNC Multi-User EMS Processes (MUMPS), are used in evaluating the drying techniques. The test chips contain arrays of surface-micromachined polysilicon cantilevers (2 km thick, 2 pm gap… CONTINUE READING
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