Colloidal pattern replication through contact photolithography operated in a 'Talbot-Fabry-Perot' regime.

Abstract

We describe a method for continuous colloidal pattern replication using contact photolithography. Cr-on-quartz masks are fabricated using colloidal nanosphere lithography and subsequently used as photolithography stamps. Hexagonal pattern arrangements with different dimensions (980, 620 and 480 nm, using colloidal particles with these respective diameters… (More)
DOI: 10.1088/0957-4484/25/14/145303

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Cite this paper

@article{Emplit2014ColloidalPR, title={Colloidal pattern replication through contact photolithography operated in a 'Talbot-Fabry-Perot' regime.}, author={Aline Emplit and Jian Xiang Lian and Isabelle Huynen and Alexandru Vlad and Micha{\"{e}l Sarrazin}, journal={Nanotechnology}, year={2014}, volume={25 14}, pages={145303} }