Corpus ID: 30883737

Clean-room Technologies for the Mini-environment Age

@inproceedings{Kure2007CleanroomTF,
  title={Clean-room Technologies for the Mini-environment Age},
  author={T. Kure and Hideo Hanaoka and T. Sugiura and S. Nakagawa},
  year={2007}
}
  • T. Kure, Hideo Hanaoka, +1 author S. Nakagawa
  • Published 2007
  • INTRODUCTION CLEAN-ROOM technologies have changed from whole-area down-flow systems, which make all areas high-cleanliness ones, to “localized” cleaning environments by means of “mini environments”— namely, an enclosed, local clean environment (1),(2) (see Fig. 1). A classic example of this shift is a semiconductor fabrication plant for 300-mm-diameter wafers, where OVERVIEW: To improve quality and production yield of various electronic devices (such as semiconductors, displays, and storage… CONTINUE READING

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    References

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    Joined Hitachi Plant Technologies, Ltd. in 1991 and now works at the Planning & Development Division, Air Conditioning System Group
    • 1991
    Joined Hitachi Plant Technologies, Ltd. in 1983 and now works at the Air Conditioning System Department, Matsudo Research Laboratory. He is currently engaged in the research and development
    • 1983