Chemical patterns of octadecyltrimethoxysilane monolayers for the selective deposition of nanoparticles on silicon substrate.

Abstract

The use of nano-objects to make the active part of reproducible nanodevices requires their controlled assembling on specific areas of substrates. In this work, we propose to use van der Waals interactions to assemble selectively gold particles covered by alkyl-thiol ligands on hydrophobic OctadecylTriMethoxySilane (OTMS) patterns defined on SiO(2)/Si… (More)

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Cite this paper

@article{Ressier2007ChemicalPO, title={Chemical patterns of octadecyltrimethoxysilane monolayers for the selective deposition of nanoparticles on silicon substrate.}, author={Laurence Ressier and Beno{\^i}t Viallet and J{\'e}r{\'e}mie Grisolia and J. P. Peyrade}, journal={Ultramicroscopy}, year={2007}, volume={107 10-11}, pages={980-4} }