Characterization of plasma-deposited and dip-coated films for critical optical applications.

@article{Partlow1987CharacterizationOP,
  title={Characterization of plasma-deposited and dip-coated films for critical optical applications.},
  author={W. D. Partlow and D P Partlow and Rui Fernando Marques Silva and J. M. Bennett},
  journal={Applied optics},
  year={1987},
  volume={26 8},
  pages={1537-45}
}
Two types of coatings were evaluated with respect to their suitability for optical applications in which low scattering is required. The plasma-deposition technique produces dense pinhole-free films of refractory materials from a glow discharge plasma at typical substrate temperatures of 200-300 degrees C. Plasma-deposited films of SiO(2) and Si(3)N(4… CONTINUE READING