Characterization of new design small water volume arm for CMP dresser

@article{Chen2017CharacterizationON,
  title={Characterization of new design small water volume arm for CMP dresser},
  author={Chuck Chen and T. S. Chen and Keh-Chia Yeh and M. H. Cheng and Jay Huang and P. W. Hung},
  journal={2017 40th International Convention on Information and Communication Technology, Electronics and Microelectronics (MIPRO)},
  year={2017},
  pages={384-386}
}
Consumption of ultrapure water (UPW) during semiconductor manufacturing processes is an important topic. A new design of water-dispensing arm employs a small volume of UPW to remove slurry residues inside pad grooves. This innovative water conditioning arm, in contrast to the conventional atomizer and diamond disc, not only reduces UPW consumption by 87… CONTINUE READING