Characterization of high refractive index semiconductor films by surface plasmon resonance.

@article{Patskovsky2006CharacterizationOH,
  title={Characterization of high refractive index semiconductor films by surface plasmon resonance.},
  author={Sergiy Patskovsky and Souleymane Toubou Bah and Michel Meunier and Andrei V. Kabashin},
  journal={Applied optics},
  year={2006},
  volume={45 25},
  pages={
          6640-5
        }
}
Si-based surface plasmon resonance (SPR) in the Kretschmann-Raether geometry is considered as a platform for the optical measurement of high refractive index films. The implementation of the SPR effect becomes possible due to the relatively high index of refraction of Si compared to most materials. As examples we study the SPR responses for some important semiconductor-based films, including laser-ablated porous silicon and thin germanium films. Using SPR data, we determine the refractive… 

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