Characterization of Graphene-based FET Fabricated using a Shadow Mask

Abstract

To pattern electrical metal contacts, electron beam lithography or photolithography are commonly utilized, and these processes require polymer resists with solvents. During the patterning process the graphene surface is exposed to chemicals, and the residue on the graphene surface was unable to be completely removed by any method, causing the graphene layer… (More)
DOI: 10.1038/srep25050

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Cite this paper

@inproceedings{Tien2016CharacterizationOG, title={Characterization of Graphene-based FET Fabricated using a Shadow Mask}, author={Dung Hoang Tien and Jun-Young Park and Ki Buem Kim and Naesung Lee and Yongho Seo}, booktitle={Scientific reports}, year={2016} }