Characterization and control of laser plasma flux parameters for soft-x-ray projection lithography.

@article{Richardson1993CharacterizationAC,
  title={Characterization and control of laser plasma flux parameters for soft-x-ray projection lithography.},
  author={Martin C. Richardson and William Thomas Silfvast and Heidi Allison Bender and Art Hanzo and Victor P. Yanovsky and Feng Jin and Jacqui Thorpe},
  journal={Applied optics},
  year={1993},
  volume={32 34},
  pages={
          6901-10
        }
}
Laser plasmas are intrinsically an attractive soft-x-ray source for projection lithography. Compact, flexible, and small enough to be dedicated to a single installation, they offer an alternative to costly multi-installation synchrotron sources. For laser plasmas to provide ideal sources of soft x rays for projection lithography, their properties must be tuned to optimize several critical parameters. High x-ray conversion in the spectral band relevant to projection lithography is obviously… CONTINUE READING
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