Characteristics of high quality ZnO thin films deposited by pulsed laser deposition

@inproceedings{Craciun1996CharacteristicsOH,
  title={Characteristics of high quality ZnO thin films deposited by pulsed laser deposition},
  author={Valentin Craciun and Jan Elders and Johannes G E Gardeniers and I. W. Boyd},
  year={1996}
}
Thin films of ZnO have been deposited on glass and silicon substrates by the pulsed laser deposition technique employing a KrF laser ~l5248 nm!. The influence of the deposition parameters, such as substrate temperature, oxygen pressure, and laser fluence on the properties of the grown films, has been studied. All the films grown over a rather wide range of deposition conditions were found to be optically transparent, electrically conductive, and c-axis oriented, with the full width at half… CONTINUE READING
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