Central masking with bilateral cochlear implants.

Abstract

Across bilateral cochlear implants, contralateral threshold shift has been investigated as a function of electrode difference between the masking and probe electrodes. For contralateral electric masking, maximum threshold elevations occurred when the position of the masker and probe electrode was approximately place-matched across ears. The amount of… (More)
DOI: 10.1121/1.4773262

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Cite this paper

@article{Lin2013CentralMW, title={Central masking with bilateral cochlear implants.}, author={Payton Lin and Thomas T. Lu and Fan-Gang Zeng}, journal={The Journal of the Acoustical Society of America}, year={2013}, volume={133 2}, pages={962-9} }