Cell Library Development Methodology for Throughput Enhancement of Electron Beam Direct-Write Lithography Systems

@article{Sugihara2005CellLD,
  title={Cell Library Development Methodology for Throughput Enhancement of Electron Beam Direct-Write Lithography Systems},
  author={Makoto Sugihara and Taiga Takata and Kenta Nakamura and Ryoichi Inanami and Hiroaki Hayashi and Katsumi Kishimoto and Tetsuya Hasebe and Yukihiro Kawano and Yusuke Matsunaga and Kazuaki Murakami and Katsuya Okumura},
  journal={2005 International Symposium on System-on-Chip},
  year={2005},
  pages={137-140}
}
We propose a cell library development methodology for throughput enhancement of electron beam direct-write (EBDW) systems. First, an ILP (integer linear programming)-based cell selection is proposed for EBDW systems in which both of the character projection (CP) and the variable shaped beam (VSB) methods are available, in order to minimize the number of electron beam (EB) shots, that is, time to fabricate chips. Secondly, the influence of cell directions on area and delay time of chips is… CONTINUE READING
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