Carboxylic acid terminated monolayer formation on crystalline silicon and silicon nitride surfaces. A surface coverage determination with a fluorescent probe in solution

@inproceedings{Cattaruzza2004CarboxylicAT,
  title={Carboxylic acid terminated monolayer formation on crystalline silicon and silicon nitride surfaces. A surface coverage determination with a fluorescent probe in solution},
  author={Fabrizio Cattaruzza and Antonio L. Cricenti and Alberto Flamini and Marco Girasole and Giulia Longo and Alessio Mezzi and Tommaso Prosperi},
  year={2004}
}
Carboxylic acid terminated (–COOH) monolayers (ML) have been covalently anchored on the surface (S) of crystalline silicon (Si) and silicon nitride (Si3N4) by using wet-chemistry methods. Their concentration has been determined adopting a stepwise procedure with a fluorescent probe in solution. First, 7-amino-4-methylcoumarin (H2N–C10H7O2, AMC) is covalently bonded to the monolayer on the surface through an amidation reaction forming an amide-terminated surface monolayer, S–(CH2)n–CO–NH–C10H7O2… CONTINUE READING

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