CHARACTERIZATION OF POLYCRYSTALLINE SILICON CARBIDE FILMS GROWN BY ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION ON POLYCRYSTALLINE SILICON

@inproceedings{Zorman1998CHARACTERIZATIONOP,
  title={CHARACTERIZATION OF POLYCRYSTALLINE SILICON CARBIDE FILMS GROWN BY ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION ON POLYCRYSTALLINE SILICON},
  author={Christian A. Zorman and Shuvo Roy and Chien Hung Wu and Aaron J. Fleischman and Mehran Mehregany},
  year={1998}
}