CD-SEM for 65-nm Process Node

  title={CD-SEM for 65-nm Process Node},
  author={Hiroki Kawada and Hidetoshi Morokuma and Seiichirou Takami and Mari Nozoe},
OVERVIEW: Inspection equipment for 90-nm and subsequent process nodes is required to have not only improved observation ability, but also further improved measurement reproducibility as well. In addition, there has arisen an increasing need for new functions for the ArF resist process, which came into use along with miniaturization, process monitoring, etc. To cope with these processes, the S-9360 CD-SEM (critical-dimension scanning electron microscope) developed by Hitachi Group features (1… CONTINUE READING


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Mechanistic Studies on the CD Degradation of 193 nm Resists during SEM Inspection

T Kudo
J. Photopolymer Sci. Technol • 2001

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