Block copolymer directed self-assembly enables sublithographic patterning for device fabrication

@inproceedings{Wong2012BlockCD,
  title={Block copolymer directed self-assembly enables sublithographic patterning for device fabrication},
  author={H.-S. Philip Wong and Chris Bencher and He Yi and Xin-Yu Bao and Li-Wen Chang},
  booktitle={Advanced Lithography},
  year={2012}
}
The use of block copolymer self-assembly for device fabrication in the semiconductor industry has been envisioned for over a decade. Early works by the groups of Hawker, Russell, and Nealey [1-2] have shown a high degree of dimensional control of the self-assembled features over large areas with high degree of ordering. The exquisite dimensional control at nanometer-scale feature sizes is one of the most attractive properties of block copolymer self-assembly. At the same time, device and… CONTINUE READING

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