Biotreatment of copper and isopropyl alcohol in waste from semiconductor manufacturing

@article{Ruiz2004BiotreatmentOC,
  title={Biotreatment of copper and isopropyl alcohol in waste from semiconductor manufacturing},
  author={Antonio Ruiz and K. L. Ogden},
  journal={IEEE Transactions on Semiconductor Manufacturing},
  year={2004},
  volume={17},
  pages={538-543}
}
The generalized use of copper chemical-mechanical planarization (CMP) in integrated circuits manufacturing is increasing as the industry moves from previous technology to copper technology. With CMP being one of the main water consumers and producers of wastewater in the fab, more low energy/cost effective methods are being developed to avoid a future risk… CONTINUE READING