Atomistic Picture of Electromigration Process and its Application to High‐yield Fabrication of Nanogap Electrodes

@inproceedings{Umeno2007AtomisticPO,
  title={Atomistic Picture of Electromigration Process and its Application to High‐yield Fabrication of Nanogap Electrodes},
  author={Akinori Umeno and Tetsuo Akasaka and Su Heon Hong and K. Hirakawa},
  year={2007}
}
Precisely controlled electromigration process was introduced as a high‐yield fabrication technique of nanogap electrodes. During the stress‐and‐relax voltage control we observed successive step‐like decreases in the conductance across the junction by one quantum of conductance 2e2/h, which corresponds to the one‐by‐one removal events of gold atoms. The yield of nanogaps showed great improvement; we have reproducibly obtained the nanogaps with resistance of ∼5 × 104 ∼ 1011 ohms (gap separation… CONTINUE READING