Atomic layer lithography of wafer-scale nanogap arrays for extreme confinement of electromagnetic waves.

@article{Chen2013AtomicLL,
  title={Atomic layer lithography of wafer-scale nanogap arrays for extreme confinement of electromagnetic waves.},
  author={Xiaoshu Chen and H Park and Matthew Pelton and Xianji Piao and Nathan C Lindquist and Hyungsoon Im and Yun Jung Kim and Jae Sung Ahn and Kwang Jun Ahn and Namkyoo Park and Dai-Sik Kim and Sang-Hyun Oh},
  journal={Nature communications},
  year={2013},
  volume={4},
  pages={2361}
}
Squeezing light through nanometre-wide gaps in metals can lead to extreme field enhancements, nonlocal electromagnetic effects and light-induced electron tunnelling. This intriguing regime, however, has not been readily accessible to experimentalists because of the lack of reliable technology to fabricate uniform nanogaps with atomic-scale resolution and high throughput. Here we introduce a new patterning technology based on atomic layer deposition and simple adhesive-tape-based planarization… CONTINUE READING
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