Atomic layer deposition of quaternary oxide (La,Sr)CoO3-δ thin films.

Abstract

A novel atomic layer deposition (ALD) process was developed for fabricating quaternary cobalt oxide (La1-xSrx)CoO3-δ thin films having the eye on future applications of such films in e.g. solid oxide fuel cell cathodes, oxygen separation membranes or thermocouples. The deposition parameters and the conditions of a subsequent annealing step were… (More)
DOI: 10.1039/c5dt00436e

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