Atomic layer deposition of dielectric overlayers for enhancing the optical properties and chemical stability of plasmonic nanoholes.

@article{Im2010AtomicLD,
  title={Atomic layer deposition of dielectric overlayers for enhancing the optical properties and chemical stability of plasmonic nanoholes.},
  author={Hyungsoon Im and Nathan C Lindquist and Antoine Lesuffleur and Sang-Hyun Oh},
  journal={ACS nano},
  year={2010},
  volume={4 2},
  pages={
          947-54
        }
}
Fabricating plasmonic nanostructures with robust optical and chemical properties remains a challenging task, especially with silver, which has superior optical properties but poor environmental stability. In this work, conformal atomic layer deposition (ALD) of thin alumina overlayers is used to precisely tune the optical transmission properties of periodic nanohole arrays made in gold and silver films. Experiments and computer simulations confirm that ALD overlayers with optimized thicknesses… CONTINUE READING
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