Atomic layer deposition of Al2O3 and TiO2 multilayers for applications as bandpass filters and antireflection coatings.

Abstract

Al(2)O(3) and TiO(2) thin films have been deposited on Si wafers, quartz, BK7 glass, and polycarbonate substrates by atomic layer deposition (ALD). The refractive indices and growth rates of the materials have been determined by spectroscopic ellipsometry and transmission electron microscopy. The influence of substrate temperature and precursor on the… (More)

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@article{Szeghalmi2009AtomicLD, title={Atomic layer deposition of Al2O3 and TiO2 multilayers for applications as bandpass filters and antireflection coatings.}, author={Adriana V Szeghalmi and Michael Helgert and Robert Brunner and Frank Heyroth and U. G{\"o}sele and Mato Knez}, journal={Applied optics}, year={2009}, volume={48 9}, pages={1727-32} }