Atomic layer deposition of Al2O3 and TiO2 multilayers for applications as bandpass filters and antireflection coatings.

@article{Szeghalmi2009AtomicLD,
  title={Atomic layer deposition of Al2O3 and TiO2 multilayers for applications as bandpass filters and antireflection coatings.},
  author={Adriana Szeghalmi and Michael Helgert and R{\'o}bert Brunner and Frank Heyroth and Ulrich Prof. Dr. G{\"o}sele and Mato Knez},
  journal={Applied optics},
  year={2009},
  volume={48 9},
  pages={
          1727-32
        }
}
Al(2)O(3) and TiO(2) thin films have been deposited on Si wafers, quartz, BK7 glass, and polycarbonate substrates by atomic layer deposition (ALD). The refractive indices and growth rates of the materials have been determined by spectroscopic ellipsometry and transmission electron microscopy. The influence of substrate temperature and precursor on the refractive indices has been investigated. The refractive index of TiO(2) significantly increases with temperature, whereas the Al(2)O(3) films… 
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