Atmospheric-pressure air plasma jet and its application to photoresist material etching

@article{Wang2011AtmosphericpressureAP,
  title={Atmospheric-pressure air plasma jet and its application to photoresist material etching},
  author={Lijun Wang and Nick Fox-Lyon and Florian Georg Chrysostomus Weilnboeck and Shenli Jia and Gottlieb S. Oehrlein},
  journal={2011 Abstracts IEEE International Conference on Plasma Science},
  year={2011},
  pages={1-1}
}
We describe the application of an atmospheric-pressure air plasma jet (APAPJ) source to polymer etching. The electrical and optical emission spectrum (OES) characteristics of APAPJ have been studied and analyzed. From OES measurements, it can be found that the emission intensities of metastable and ionized molecular nitrogen N2* and N2+ is stronger and the emission intensity of N2* is dominant. With the increase of power voltage, the emission intensity of excited species is increased. Based on… CONTINUE READING