Assessment of potential gains in productivity due to proactive reticle management using discrete event simulation

@inproceedings{Park1999AssessmentOP,
  title={Assessment of potential gains in productivity due to proactive reticle management using discrete event simulation},
  author={Sungmin Park and John W. Fowler and W. Matthew Carlyle and Matt Hickie},
  booktitle={Winter Simulation Conference},
  year={1999}
}
Photolithography is often the constraining equipment semiconductor wafer fabrication plants due to the numb of times the product must process through it. Modern d photolithography is performed on a cluster tool that is combination of a stepper and track. It is obvious that combined availability of the cluster tool is critical to throughput, but what is not so obvious is the throughp restriction from a secondary constraint known as a retic Every layer of a product needs a unique reticle f… CONTINUE READING