Area-selective atomic layer deposition of platinum using photosensitive polyimide.

Abstract

Area-selective atomic layer deposition (AS-ALD) of platinum (Pt) was studied using photosensitive polyimide as a masking layer. The polyimide films were prepared by spin-coating and patterned using photolithography. AS-ALD of Pt using poly(methyl-methacrylate) (PMMA) masking layers was used as a reference. The results show that polyimide has excellent… (More)
DOI: 10.1088/0957-4484/27/40/405302

Topics

Figures and Tables

Sorry, we couldn't extract any figures or tables for this paper.