Applications of Photocurable PMMS Thiol-Ene Stamps in Soft Lithography

Abstract

Luis M. Campos, Tu T. Truong, Dong Eun Shim, Michael D. Dimitriou, Daniel Shir, Ines Meinel, ) Jeffrey A. Gerbec, ) H. Thomas Hahn, John A. Rogers, and Craig J. Hawker* Materials Research Laboratory, Mitsubishi Chemical Center for Advanced Materials, Department of Chemistry and Biochemistry, and Materials Department, University of California, Santa Barbara, California 93106, Department of Chemistry, Department of Materials Science and Engineering, and Department of Electrical and Computer Engineering, Beckman Institute and Frederick Seitz Materials Research Laboratory, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801, Department of Mechanical and Aerospace Engineering and Multifunctional Composites Laboratory, University of California, Los Angeles, California 90095, and ) MC Research and Innovation Center, 601 Pine Avenue, Goleta, California 93117

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Cite this paper

@inproceedings{Campos2009ApplicationsOP, title={Applications of Photocurable PMMS Thiol-Ene Stamps in Soft Lithography}, author={Lu{\'i}s Miguel Campos and T . T . Stuckey Truong and Dong Eun Shim and Michael D. Dimitriou and Daniel Jay-Lee Shir and Ines Meinel and Jeffrey A. Gerbec and Thomas Hahn and John A. Rogers and Craig J Hawker}, year={2009} }