Applications of Control to Semiconductor Manufacturing: Reactive Ion Etching

@article{Elta1993ApplicationsOC,
  title={Applications of Control to Semiconductor Manufacturing: Reactive Ion Etching},
  author={Michael E. Elta and Hossein Etemad and J. S. Freudenberg and M. D. Giles and J. W. Grizzle and P. Kabamba and Pramod P. Khargonekar and St{\'e}phane Lafortune and S. M. Meerkov and James R. Moyne and B. A. Rashap and Demosthenis Teneketzis and F. L. Terry},
  journal={1993 American Control Conference},
  year={1993},
  pages={2990-2997}
}
This paper describes the development of real-time control technology for the improvement of manufacturing characteristics of reactive ion etchers. A general control strategy is presented as well as supporting experimental results. 

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