Application of Thin-Film Micromachining on Glass

@inproceedings{Boucinha1998ApplicationOT,
  title={Application of Thin-Film Micromachining on Glass},
  author={M. Boucinha and Virginia Chu and Jo{\~a}o Pedro Conde},
  year={1998}
}
  • M. Boucinha, Virginia Chu, João Pedro Conde
  • Published 1998
  • Materials Science
  • Three dimensional microstructures have been made on glass substrates using surface micromachining techniques. Bridge structures were fabricated using both hydrogenated amorphous silicon and microcrystalline silicon. A low density silicon nitride with an etch rate of 100 A/s in buffered HF was used as the sacrificial layer. As an example of how micromachining can be applied to large area electronics, thin film transistors (TFT) with the dielectric replaced by an air-gap were fabricated. The… CONTINUE READING

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