• Chemistry
  • Published 2014

Apparatus and method for monitoring a discharge in a plasma process

@inproceedings{D2014ApparatusAM,
  title={Apparatus and method for monitoring a discharge in a plasma process},
  author={D·莱波尔德 and U·里希特 and F·文恩},
  year={2014}
}
Discharge in a plasma process, in particular the cathode sputtering configuration device and method for monitoring the discharge between the electrodes of 13-generator supplying electric power with an output signal periodically varying the generator to the cathode sputtering configuration (13) is , a. The method comprising detecting at least one of the at least a first signal path (2) of the plasma supply signal (19) in at least a first time range in the at least one period of the supply signal… CONTINUE READING