Antireflection behavior of multidimensional nanostructures patterned using a conformable elastomeric phase mask in a single exposure step.

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@article{Park2010AntireflectionBO, title={Antireflection behavior of multidimensional nanostructures patterned using a conformable elastomeric phase mask in a single exposure step.}, author={Junyong Park and Sanghoon Yoon and Kisuk Kang and Seokwoo Jeon}, journal={Small}, year={2010}, volume={6 18}, pages={1981-5} }