Analysis of IR-Drop Scaling with Implications for Deep Submicron P / G Network Designs

@inproceedings{Ajami2001AnalysisOI,
  title={Analysis of IR-Drop Scaling with Implications for Deep Submicron P / G Network Designs},
  author={Amir H. Ajami and Kaustav Banerjee and Amit Mehrotra and Massoud Pedram},
  year={2001}
}
This paper presents a detailed analysis of the power-supply voltage (IR) drop scaling in DSM technologies. For the first time, the effects of temperature, electromigration and interconnect technology scaling (including resistivity increase of Cu interconnects due to electron surface scattering and finite barrier thickness) are taken into consideration during this analysis. It is shown that the IR-drop effect in the power/ground (P/G) network increases rapidly with technology scaling, and using… CONTINUE READING
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