An overview of the modified chemical vapor deposition (MCVD) process and performance

@article{Nagel1982AnOO,
  title={An overview of the modified chemical vapor deposition (MCVD) process and performance},
  author={Suzanne R. Nagel and John Burnette Macchesney and Kenneth Lee Walker},
  journal={IEEE Journal of Quantum Electronics},
  year={1982},
  volume={18},
  pages={459-476}
}
This paper reviews the MCVD process, with special emphasis on fiber design and material choices, understanding of mechanisms involved in the process, process improvements, and performance. 
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References

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The mass transfer of particulates of silica and germania is characteristic of the MCVD process for preparing optical fiber preforms. Here, after considering a number of alternatives, it is suggested
Fabrication of long fibers by an improved chemical vapor deposition method (HCVD method)
An improved (CVD) method was developed to fabricate long fibers. He gas mixed with O2 and raw material vapors were introduced into the CVD gas system to increase the deposition rate. This produced a
Fiber drawing, coating, and jacketing
The fiber drawing and coating process impacts strongly on the transmission and strength properties of optical fibers. Current practices which lead to realization of optimum fiber properties are
The preparation of optical waveguide preforms by plasma deposition
Optical fiber preforms are prepared by a technique similar to the modified CVD process, except that an RF plasma is used. Optical losses as low as 6.5 dB/km at 1.06 μm were achieved. Higher reaction
Improved chemical vapour deposition method for long-length optical fibre
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Thermophoretic Deposition of Small Particles in the Modified Chemical Vapor Deposition (MCVD) Process
Thermophoresis is conclusively established as the particulate deposition mechanism in the MCVD process by comparing experimental measurements and quantitative theoretical predictions. The deposition
Materials and processes for fiber preform fabrication—Vapor-phase axial deposition
The vapor-phase axial deposition (VAD) process was developed to realize continuous fabrication of high-silica fiber preforms. This process could be used to fabricate various kinds of optical fibers
Partition of Hydrogen in the Modified Chemical Vapor Deposition Process
In the modified chemical vapor deposition (MCVD) process for making glass fibers, most of the hydrogen coming into the reaction from hydrogen-bearing impurities in the starting materials is not
Fabrication of optical waveguides by the outside vapor deposition process
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Effect of deposition rate on spectral loss of GeO2-P2O5-SiO2 graded index fibres
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