An improved etching process used for the fabrication of submicron Nb/AlO/sub x//Nb Josephson junctions

Abstract

It is important to develop a reliable and reproducible fabrication process of submicron Nb/AlO/sub x//Nb Josephson junctions to improve the integration level and the operating speed of the Josephson LSI circuit. For this purpose, we have developed an improved etching process by introducing a dummy etching process and using a scanning electron microscope… (More)

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