An efficient algorithm for stencil planning and optimization in E-beam lithography

Abstract

Character projection is a promising technique to dramatically improve throughput of E-beam lithography. However, its effectiveness depends on how good the stencils are planned and optimized. Recently Kuang and Young proposed an efficient heuristic based on 2-D bin-packing for the stencil optimization. In this paper, we identified drawbacks in their approaches, and developed a better algorithm that reduces the shot numbers to less than half of theirs in average. The key point is introducing the merit frequency/area (f/A) to select candidate characters and proposing an accurate and efficient algorithm to estimate the occupied area of characters before placement. Experimental results verify the effectiveness of the proposed method.

DOI: 10.1109/ASPDAC.2017.7858350

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Cite this paper

@article{Ge2017AnEA, title={An efficient algorithm for stencil planning and optimization in E-beam lithography}, author={Jiabei Ge and Changhao Yan and Hai Zhou and Dian Zhou and Xuan Zeng}, journal={2017 22nd Asia and South Pacific Design Automation Conference (ASP-DAC)}, year={2017}, pages={366-371} }