An atom passing through a hole in a dielectric membrane: impact of dispersion forces on mask-based matter-wave lithography

  title={An atom passing through a hole in a dielectric membrane: impact of dispersion forces on mask-based matter-wave lithography},
  author={Johannes Fiedler and Bodil Holst},
  journal={Journal of Physics B: Atomic, Molecular and Optical Physics},
  • J. FiedlerB. Holst
  • Published 11 January 2022
  • Physics
  • Journal of Physics B: Atomic, Molecular and Optical Physics
Fast, large area patterning of arbitrary structures down to the nanometre scale is of great interest for a range of applications including the semiconductor industry, quantum electronics, nanophotonics and others. It was recently proposed that nanometre-resolution mask lithography can be realised by sending metastable helium atoms through a binary holography mask consisting of a pattern of holes. However, these first calculations were done using a simple scalar wave approach, which did not… 
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