• Corpus ID: 35053578

An Open-Source, Extensible Software Suite for CVD Process Simulation

@inproceedings{Goodwin2002AnOE,
  title={An Open-Source, Extensible Software Suite for CVD Process Simulation},
  author={David G. Goodwin},
  year={2002}
}
Chemical vapor deposition processes involve a complex interplay of chemistry and transport, both in the vapor and on the surface. Arriving at a mechanistic understanding usually requires both experimental process diagnostics and numerical simulation. Just as appropriate tools (gas chromatographs, lasers, spectrometers) are required for diagnostics, suitable numerical tools are needed for simulation, including ones to compute chemical equilibrium, simulate stirred reactors or reacting flow… 

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